Semiconductor integrated circuit device

ABSTRACT

A layout structure of a capacitive cell using forksheet FETs is provided. In transistors P 3  and N 3 , VDD is supplied to a pair of pads and a gate interconnect, and VSS is supplied to a pair of pads and a gate interconnect. Capacitances are produced between nanosheets and the gate interconnect and between nanosheets and the gate interconnect. The faces of the nanosheets closer to the nanosheets are exposed from the gate interconnect, and the faces of the nanosheets closer to the nanosheets are exposed from the gate interconnect.

CROSS-REFERENCE TO RELATED APPLICATIONS

This is a continuation of International Application No. PCT/JP2021/004379 filed on Feb. 5, 2021, which claims priority to Japanese Patent Application No. 2020-029453 filed on Feb. 25, 2020. The entire disclosures of these applications are incorporated by reference herein.

BACKGROUND

The present disclosure relates to a semiconductor integrated circuit device provided with nanosheet (nanowire) field effect transistors (FETs).

As a method for forming a semiconductor integrated circuit on a semiconductor substrate, a standard cell method is known. The standard cell method is a method in which basic units (e.g., inverters, latches, flipflops, and full adders) having specific logical functions are prepared in advance as standard cells, and a plurality of such standard cells are placed on a semiconductor substrate and connected through interconnects, thereby designing an LSI chip.

Also, as for transistors as basic constituents of an LSI, improvement in integration degree, reduction in operating voltage, and improvement in operating speed have been achieved thanks to scaling of the gate length. Recently, however, increase in off current due to excessive scaling and the resulting significant increase in power consumption have raised a problem. To solve this problem, three-dimensional transistors having a three-dimensional structure, changed from the conventional planar structure, have been vigorously studied. As one type of such three-dimensional transistors, nanosheet (nanowire) FETs have received attention. P. Weckx et al., “Stacked nanosheet fork architecture for SRAM design and device co-optimization toward 3 nm,” 2017 IEEE International Electron Devices Meeting (IEDM), December 2017, IEDM17-505-508 (Document 1) and P. Weckx et al., “Novel forksheet device architecture as ultimate logic scaling device towards 2 nm,” 2019 IEEE International Electron Devices Meeting (IEDM), December 2019, IEDM19-871-874 (Document 2) disclose layouts of SRAM cells and standard cells using nanosheet FETs each having a gate electrode shaped like a fork.

Note that the nanosheet FET having a fork-shaped gate electrode is hereinafter called a forksheet FET following Document 1.

The recent progress toward further miniaturization and higher integration in semiconductor integrated circuits is significant. With this, decrease in operating voltage and increase in operating frequency are being accelerated. With the speedup, however, noise increases, and with the voltage reduction, noise immunity decreases, causing a problem that noise-caused circuit malfunctions tend to occur in recent semiconductor integrated circuits. As a method for preventing noise-caused circuit malfunctions, there is a method in which a decoupling capacitance is provided between power supplies of a circuit. A cell having such a decoupling capacitance is called a capacitive cell.

As of today, however, no examination has been made on a capacitive cell using forksheet FETs.

An objective of the present disclosure is providing a layout structure of a capacitive cell using forksheet FETs.

SUMMARY

According to the first mode of the present disclosure, a semiconductor integrated circuit device including a standard cell that is a capacitive cell is provided. The standard cell has a p-type region in which p-type transistors are formed and an n-type region in which n-type transistors are formed lying adjacent to each other in a first direction, and includes: a first nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in a second direction vertical to the first direction in the p-type region; a second nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in the second direction in the n-type region; a first gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the first nanosheet unit in the first direction and a third direction perpendicular to the first and second directions; a first pair of pads each connected with each end of the nanosheet of the first nanosheet unit in the second direction; a second gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the second nanosheet unit in the first direction and the third direction; and a second pair of pads each connected with each end of the nanosheet of the second nanosheet unit in the second direction, wherein the first pair of pads and the second gate interconnect are supplied with a first power supply voltage, and the second pair of pads and the first gate interconnect are supplied with a second power supply voltage lower than the first power supply voltage, and the first nanosheet unit and the second nanosheet unit are opposed to each other in the first direction, a nanosheet among the nanosheet of the first nanosheet unit closest to the second nanosheet unit is exposed from the first gate interconnect on a face opposed to the second nanosheet unit in the first direction, and a nanosheet among the nanosheet of the second nanosheet unit closest to the first nanosheet unit is exposed from the second gate interconnect on a face opposed to the first nanosheet unit in the first direction.

According to the above mode, since the first power supply voltage is supplied to the first pair of pads and the second gate interconnect and the second power supply voltage is supplied to the second pair of pads and the first gate interconnect, capacitances are produced between the first nanosheet unit and the first gate interconnect and between the second nanosheet unit and the second gate interconnect. In addition, capacitances are produced between the first gate interconnect and the second gate interconnect and between the first pair of pads and the second pair of pads. A nanosheet among the nanosheet of the first nanosheet unit closest to the second nanosheet unit is exposed from the first gate interconnect on its face opposed to the second nanosheet unit, and a nanosheet among the nanosheet of the second nanosheet unit closest to the first nanosheet unit is exposed from the second gate interconnect on its face opposed to the first nanosheet unit. Therefore, since the spacing between the first nanosheet unit and the second nanosheet unit can be reduced, the area of the capacitive cell can be made smaller. Also, larger capacitances can be secured between the first gate interconnect and the second gate interconnect and between the first pair of pads and the second pair of pads.

According to the second mode of the present disclosure, a semiconductor integrated circuit device including a standard cell that is a capacitive cell is provided. The standard cell has a first region in which transistors of a first-conductivity type are formed and a second region in which transistors of a second conductivity type are formed lying adjacent to each other in a first direction, and includes: a first nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in a second direction vertical to the first direction in the first region; a second nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in the second direction in the second region; a first gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the first nanosheet unit in the first direction and a third direction perpendicular to the first and second directions; a first pair of pads each connected with each end of the nanosheet of the first nanosheet unit in the second direction; a second gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the second nanosheet unit in the first direction and the third direction; and a second pair of pads each connected with each end of the nanosheet of the second nanosheet unit in the second direction, the first and second gate interconnects are supplied with a first power supply voltage, and the first and second pairs of pads are supplied with a second power supply voltage different from the first power supply voltage, and the first nanosheet unit and the second nanosheet unit are opposed to each other in the first direction, a nanosheet among the nanosheet of the first nanosheet unit closest to the second nanosheet unit is exposed from the first gate interconnect on a face opposed to the second nanosheet unit in the first direction, and a nanosheet among the nanosheet of the second nanosheet unit closest to the first nanosheet unit is exposed from the second gate interconnect on a face opposed to the first nanosheet unit in the first direction.

According to the above mode, since the first power supply voltage is supplied to the first and second gate interconnects and the second power supply voltage is supplied to the first and second pairs of pads, capacitances are produced between the first nanosheet unit and the first gate interconnect and between the second nanosheet unit and the second gate interconnect. A nanosheet among the nanosheet of the first nanosheet unit closest to the second nanosheet unit is exposed from the first gate interconnect on its face opposed to the second nanosheet unit, and a nanosheet among the nanosheet of the second nanosheet unit closest to the first nanosheet unit is exposed from the second gate interconnect on its face opposed to the first nanosheet unit. Therefore, since the spacing between the first nanosheet unit and the second nanosheet unit can be reduced, the area of the capacitive cell can be made smaller.

According to the present disclosure, a layout structure of a large-capacity capacitive cell using forksheet FETs can be implemented.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a plan view showing a layout structure of a capacitive cell according to the first embodiment.

FIGS. 2A-2B are cross-sectional views of the layout structure of FIG. 1 taken horizontally as viewed in plan.

FIGS. 3A-3C are cross-sectional views of the layout structure of FIG. 1 taken vertically as viewed in plan.

FIG. 4 is a circuit diagram of the capacitive cell shown in FIGS. 1, 2A-2B, and 3A-3C.

FIGS. 5A-5B are cross-sectional views of a layout structure of a capacitive cell according to an alteration of the first embodiment.

FIG. 6 is a plan view showing a layout structure of a capacitive cell according to the second embodiment.

FIGS. 7A-7B are cross-sectional views of the layout structure of FIG. 6 taken vertically as viewed in plan.

FIG. 8 is a circuit diagram of the capacitive cell shown in FIGS. 6 and 7A-7B.

FIG. 9 is a plan view showing a layout structure of a capacitive cell according to Alteration 1 of the second embodiment.

FIG. 10 is a circuit diagram of the capacitive cell shown in FIG. 9 .

FIG. 11 is a plan view showing a layout structure of a capacitive cell according to Alteration 2 of the second embodiment.

FIG. 12 is a circuit diagram of the capacitive cell shown in FIG. 11 .

FIGS. 13A and 13B are views showing a basic structure of a forksheet FET, where FIG. 13A is a plan view and FIG. 13B is a cross-sectional view.

DETAILED DESCRIPTION

Embodiments of the present disclosure will be described hereinafter with reference to the accompanying drawings. In the following embodiments, it is assumed that the semiconductor integrated circuit device includes a plurality of standard cells (hereinafter simply called cells as appropriate), and at least some of the standard cells include forksheet field effect transistors (FETs). The nanosheet FET is a FET using a thin sheet (nanosheet) through which a current flows. Such a nanosheet is formed of silicon, for example. In the semiconductor integrated circuit device, it is assumed that some of the nanosheet FETs are forksheet FETs each having a fork-shaped gate electrode.

In the present disclosure, a semiconductor layer portion formed on each end of a nanosheet to constitute a terminal that is to be the source or drain of a nanosheet FET is called a “pad.”

First, the basic structure of a forksheet FET will be described.

FIGS. 13A-13B are views showing a basic structure of a forksheet FET, where FIG. 13A is a plan view and FIG. 13B is a cross-sectional view taken along line Y-Y′ in FIG. 13A. In the basic structure of FIGS. 13A-13B, two transistors TR1 and TR2 are placed side by side with space S between them in the Y direction. A gate interconnect 531 that is to be the gate of the transistor TR1 and a gate interconnect 532 that is to be the gate of the transistor TR2 extend in the Y direction and are at the same position in the X direction.

A channel portion 521 that is to be the channel region of the transistor TR1 and a channel portion 526 that is to be the channel region of the transistor TR2 are constituted by nanosheets. In FIGS. 13A-13B, the channel portions 521 and 526 are each constituted by a stacked structure of three nanosheets overlapping as viewed in plan. Pads 522 a and 522 b that are to be the source and drain regions of the transistor TR1 are formed on both sides of the channel portion 521 in the X direction. Pads 527 a and 527 b that are to be the source and drain regions of the transistor TR2 are formed on both sides of the channel portion 526 in the X direction. The pads 522 a and 522 b are formed by epitaxial growth from the nanosheets constituting the channel portion 521. The pads 527 a and 527 b are formed by epitaxial growth from the nanosheets constituting the channel portion 526.

The gate interconnect 531 surrounds the peripheries of the nanosheets constituting the channel portion 521 in the Y and Z directions via gate insulating films (not shown). Note however that the faces of the nanosheets constituting the channel portion 521 on the side closer to the transistor TR2 in the Y direction are exposed, not covered with the gate interconnect 531. That is, in the cross-sectional view of FIG. 13B, the gate interconnect 531 does not cover the right side faces of the nanosheets constituting the channel portion 521 but covers the upper, lower, and left side faces of the nanosheets. The gate interconnect 531 protrudes from the nanosheets constituting the channel portion 521 by a length OL toward the side away from the transistor TR2 in the Y direction.

The gate interconnect 532 surrounds the peripheries of the nanosheets constituting the channel portion 526 in the Y and Z directions via gate insulating films (not shown). Note however that the faces of the nanosheets constituting the channel portion 526 on the side closer to the transistor TR1 in the Y direction are exposed, not covered with the gate interconnect 532. That is, in the cross-sectional view of FIG. 13B, the gate interconnect 532 does not cover the left side faces of the nanosheets constituting the channel portion 526 but covers the upper, lower, and right side faces of the nanosheets. The gate interconnect 532 protrudes from the nanosheets constituting the channel portion 526 by a length OL toward the side away from the transistor TR1 in the Y direction.

Here, the gate effective width Weff of each nanosheet is represented by

Weff=2×W+H

where W is the width (size in the Y direction) of the nanosheet, and H is the height (size in the Z direction) thereof. Since the channel portions 521 and 526 of the transistors TR1 and TR2 are each constituted by three nanosheets, the gate effective width of each of the transistors TR1 and TR2 is

3×(2×W+H).

In the structure of FIGS. 13A-13B, the gate interconnect 531 does not protrude from the nanosheets constituting the channel portion 521 toward the transistor TR2 in the Y direction. Also, the gate interconnect 532 does not protrude from the nanosheets constituting the channel portion 526 toward the transistor TR1 in the Y direction. This can bring the transistors TR1 and TR2 closer to each other and thus achieve area reduction.

The number of nanosheets constituting the channel portion of each transistor is not limited to three. The channel portion may be constituted by one nanosheet, or may be constituted by a stacked structure of a plurality of nanosheets overlapping as viewed in plan. Also, while the cross-sectional shape of the nanosheets is illustrated as rectangular in FIG. 13B, it is not limited to this. For example, the shape may be square, circular, or oval.

The semiconductor storage device may include both forksheet FETs and other nanosheet FETs where a gate interconnect surrounds the entire peripheries of nanosheets, in a mixed manner

As used herein, “VDD” and “VS S” refer to the power supply voltages or the power supplies themselves. Also, as used herein, an expression indicating that sizes such as widths are identical, like the “same wiring width,” is to be understood as including a range of manufacturing variations.

First Embodiment

FIGS. 1, 2A-2B, and 3A-3C are views showing a layout structure of a capacitive cell according to the first embodiment, where FIG. 1 is a plan view, FIGS. 2A-2B are cross-sectional views taken horizontally as viewed in plan, and FIGS. 3A-3C are cross-sectional views taken vertically as viewed in plan. Specifically, FIG. 2A shows a cross section taken along line X1-X1′, FIG. 2B shows a cross section taken along line X2-X2′, FIG. 3A shows a cross section taken along line Yl-Y1′, FIG. 3B shows a cross section taken along line Y2-Y2′, and FIG. 3C shows a cross section taken along line Y3-Y3′.

Note that, in the plan views such as FIG. 1 , the horizontal direction in the figure is hereinafter referred to as an X direction (corresponding to the second direction), the vertical direction in the figure as a Y direction (corresponding to the first direction), and the direction perpendicular to the substrate plane as a Z direction (corresponding to the third direction).

FIG. 4 is a circuit diagram of the capacitive cell shown in FIGS. 1, 2A-2B, and 3A-3C. As shown in FIG. 4 , the capacitive cell has p-type transistors P1, P2, P3, P4, and P5 and n-type transistors N1, N2, N3, N4, and N5. The transistors P2 to P4 and the transistors N2 to N4 function as capacitances. The transistor P1 and the transistor N5 constitute a fixed value output unit 5. The fixed value output unit 5 outputs a low fixed value (VSS) to a node X1 and a high fixed value (VDD) to a node X2. The transistor P1 is connected to VDD at its source, to the gate of the transistor N5 at its drain, and to the drain of the transistor N5 at its gate. The transistor N5 is connected to VSS at its source and to the gate of the transistor P1 at its drain. The gate of the transistor P1 corresponds to the node X1, and the gate of the transistor N5 corresponds to the node X2.

The transistors P5 and N1 are off-state transistors. Although the transistors P5 and N1 are not necessarily required for the circuit configuration of the capacitive cell, the presence of these transistors improves the regularity of the layout of the capacitive cell, which improves the ease of device manufacture, improves the yield, and reduces manufacturing variations.

The transistors P2 to P4 are connected to VDD at their sources and drains and to the node X1 at their gates. Since VSS is output to the node X1 from the fixed value output unit 5, the transistors P2 to P4 function as capacitances. The transistors N2 to N4 are connected to VSS at their sources and drains and to the node X2 at their gates. Since VDD is output to the node X2 from the fixed value output unit 5, the transistors N2 to N4 function as capacitances.

The capacitive cell of FIGS. 1, 2A-2B, and 3A-3C and other standard cells are arranged in a row in the X direction with cell limits CL of each cell in touch with adjacent ones, thereby constituting a cell row. A plurality of such cell rows are arranged in the Y direction with cell limits CL in touch with adjacent ones. Note that such cell rows are inverted vertically every other row.

As shown in FIG. 1 , power lines 11 and 12 extending in the X direction are provided along both ends of the capacitive cell in the Y direction. The power lines 11 and 12 are both buried power rails (BPR) formed in a buried interconnect layer. The power line 11 supplies the power supply voltage VDD, and the power line 12 supplies the power supply voltage VSS. The power lines 11 and 12 are shared with other cells in the cell row including this capacitive cell, serving as power lines extending in the X direction. Also, the power lines 11 and 12 each serve as a power line provided astride the cell rows adjacent in the Y direction.

The p-type transistors P1, P2, P3, P4, and P5 are formed in a p-type region on an N-well, and the n-type transistors N1, N2, N3, N4, and N5 are formed in an n-type region on a P-substrate. The p-type region and the n-type region are adjacent to each other in the Y direction. The positions of the transistors P1, P2, P3, P4, and P5 are the same as the positions of the transistors N1, N2, N3, N4, and N5, respectively, in the X direction. That is, the transistors P1 and N1 are placed in line in the Y direction, the transistors P2 and N2 are placed in line in the Y direction, the transistors P3 and N3 are placed in line in the Y direction, the transistors P4 and N4 are placed in line in the Y direction, and the transistors P5 and N5 are placed in line in the Y direction.

The transistors P1, P2, P3, P4, and P5 have nanosheets 21 a, 21 b, 21 c, 21 d, and 21 e, respectively, each having three stacked sheets overlapping as viewed in plan, as channel portions. That is, the transistors P1, P2, P3, P4, and P5 are nanosheet FETs.

As shown in FIG. 1 , pads 22 a, 22 b, 22 c, 22 d, 22 e, and 22 f, each formed of an integral semiconductor layer connected to the stacked structure of three sheets, are formed on the left side of the nanosheets 21 a in the figure, between the nanosheets 21 a and 21 b, between the nanosheets 21 b and 21 c, between the nanosheets 21 c and 21 d, between the nanosheets 21 d and 21 e, and on the right side of the nanosheet 21 e in the figure, respectively. The pads 22 a and 22 b are to be the source region and drain region of the transistor P1, the pads 22 b and 22 c are to be the source region and drain region of the transistor P2, the pads 22 c and 22 d are to be the source region and drain region of the transistor P3, the pads 22 d and 22 e are to be the source region and drain region of the transistor P4, and the pads 22 e and 22 f are to be the source region and drain region of the transistor P5.

The transistors N1, N2, N3, N4, and N5 have nanosheets 26 a, 26 b, 26 c, 26 d, and 26 e, respectively, each having three stacked sheets overlapping as viewed in plan, as channel portions. That is, the transistors N1, N2, N3, N4, and N5 are nanosheet FETs.

As shown in FIG. 1 , pads 27 a, 27 b, 27 c, 27 d, 27 e, and 27 f, each formed of an integral semiconductor layer connected to the stacked structure of three sheets, are formed on the left side of the nanosheets 26 a in the figure, between the nanosheets 26 a and 26 b, between the nanosheets 26 b and 26 c, between the nanosheets 26 c and 26 d, between the nanosheets 26 d and 26 e, and on the right side of the nanosheet 26 e in the figure, respectively. The pads 27 a and 27 b are to be the source region and drain region of the transistor N1, the pads 27 b and 27 c are to be the source region and drain region of the transistor N2, the pads 27 c and 27 d are to be the source region and drain region of the transistor N3, the pads 27 d and 27 e are to be the source region and drain region of the transistor N4, and the pads 27 e and 27 f are to be the source region and drain region of the transistor N5.

Gate interconnects 31 a, 31 b, 31 c, 31 d, and 31 e extending in parallel in the Y direction are formed in the p-type region. The gate interconnects 31 a, 31 b, 31 c, 31 d, and 31 e have the same width and are placed at the same pitch. Gate interconnects 36 a, 36 b, 36 c, 36 d, and 36 e extending in parallel in the Y direction are formed in the n-type region. The gate interconnects 36 a, 36 b, 36 c, 36 d, and 36 e have the same width and are placed at the same pitch. The positions of the gate interconnects 31 a, 31 b, 31 c, 31 d, and 31 e are the same as the positions of the gate interconnects 36 a, 36 b, 36 c, 36 d, and 36 e, respectively, in the X direction. That is, the gate interconnects 31 a and 36 a are placed in line in the Y direction, the gate interconnects 31 b and 36 b are placed in line in the Y direction, the gate interconnects 31 c and 36 c are placed in line in the Y direction, the gate interconnects 31 d and 36 d are placed in line in the Y direction, and the gate interconnects 31 e and 36 e are placed in line in the Y direction. Dummy gate interconnects 38a and 38b are formed on the cell limits CL on both sides in the X direction.

The gate interconnect 31 a surrounds the peripheries of the nanosheets 21 a of the transistor P1 in the Y and Z directions through gate insulating films (not shown). The gate interconnect 31 a is to be the gate of the transistor P1. Similarly, the gate interconnects 31 b, 31 c, 31 d, and 31 e surround the peripheries of the nanosheets 21 b, 21 c, 21 d, and 21 e of the transistors P2, P3, P4, and P5, respectively, in the Y and Z directions through gate insulating films (not shown). The gate interconnects 31 b, 31 c, 31 d, and 31 e are to be the gates of the transistors P2, P3, P4, and P5, respectively.

The gate interconnect 36 a surrounds the peripheries of the nanosheets 26 a of the transistor N1 in the Y and Z directions through gate insulating films (not shown). The gate interconnect 36 a is to be the gate of the transistor Ni. Similarly, the gate interconnects 36 b, 36 c, 36 d, and 36 e surround the peripheries of the nanosheets 26 b, 26 c, 26 d, and 26 e of the transistors N2, N3, N4, and N5, respectively, in the Y and Z directions through gate insulating films (not shown). The gate interconnects 36 b, 36 c, 36 d, and 36 e are to be the gates of the transistors N2, N3, N4, and N5, respectively.

The gate interconnects 31 a and 36 a placed side by side in the Y direction are mutually connected through a bridge 33 a formed between the gate interconnects 31 a and 36 a. The gate interconnects 31 e and 36 e placed side by side in the Y direction are mutually connected through a bridge 33 b formed between the gate interconnects 31 e and 36 e.

Local interconnects 41, 42, 43 a, 43 b, 43 c, 43 d, 44 a, 44 b, 44 c, and 44 d extending in the Y direction are formed in a local interconnect layer. The local interconnect 41 is connected with the pads 22 a and 27 a, and the local interconnect 42 is connected with the pads 22 f and 27 f. The local interconnects 43 a, 43 b, 43 c, and 43 d are connected with the pads 22 b, 22 c, 22 d, and 22 e, respectively, and also connected with the power line 11 through vias. The local interconnects 44 a, 44 b, 44 c, and 44 d are connected with the pads 27 b, 27 c, 27 d, and 27 e, respectively, and also connected with the power line 12 through vias.

Metal interconnects 51, 52, 53, and 54 extending in the X direction are formed in an M1 interconnect layer. The metal interconnects 52 and 54 correspond to the node X1 of the circuit, and the metal interconnects 51 and 53 correspond to the node X2 of the circuit. The metal interconnect 51 is connected with the gate interconnect 31 e through a via and also connected with the local interconnect 41 through a via. The metal interconnect 52 is connected with the gate interconnects 31 a, 31 b, 31 c, and 31 d through vias and also connected with the local interconnect 42 through a via. The metal interconnect 53 is connected with the gate interconnects 36 b, 36 c, 36 d, and 36 e through vias and also connected with the local interconnect 41 through a via. The metal interconnect 54 is connected with the gate interconnect 36 a through a via and also connected with the local interconnect 42 through a via. The metal interconnects 51, 52, 53, and 54 form wiring capacitances.

The nanosheets 21 a and the nanosheets 26 a are opposed to each other in the Y direction. The faces of the nanosheets 21 a closer to the nanosheets 26 a in the Y direction are exposed, not covered with the gate interconnect 31 a. The faces of the nanosheets 26 a closer to the nanosheets 21 a in the Y direction are exposed, not covered with the gate interconnect 36 a.

Similarly, the nanosheets 2 lb and the nanosheets 26 b are opposed to each other in the Y direction, the nanosheets 21 c and the nanosheets 26 c are opposed to each other in the Y direction, the nanosheets 21 d and the nanosheets 26 d are opposed to each other in the Y direction, and the nanosheets 21 e and the nanosheets 26 e are opposed to each other in the Y direction. The faces of the nanosheets 21 b, 21 c, 21 d, and 21 e closer to the nanosheets 26 b, 26 c, 26 d, and 26 e, respectively, in the Y direction are exposed, not covered with the gate interconnects 31 b, 31 c, 31 d, and 31 e, respectively. The faces of the nanosheets 26 b, 26 c, 26 d, and 26 e closer to the nanosheets 21 b, 21 c, 21 d, and 21 e, respectively, in the Y direction are exposed, not covered with the gate interconnects 36 b, 36 c, 36 d, and 36 e, respectively.

Here, focus on the transistor P3 functioning as a capacitance. In the transistor P3, VSS is supplied to the gate interconnect 31 c that is to be its gate from the node X1, and VDD is supplied to the pads 22 c and 22 d that are to be its source and drain through the local interconnects 43 b and 43 c. This produces capacitances via gate oxide films of the transistor P3. Also, capacitances are produced at the following positions:

-   1) between the pads 22 c and 22 d and the gate interconnect 31 c     (see FIG. 2A); -   2) between the local interconnects 43 b and 43 c and the gate     interconnect 31 c (see FIG. 2A); -   3) between the gate interconnect 31 c and the gate interconnect 36 c     of the transistor N3 (see FIG. 3A) (VDD is supplied to the gate     interconnect 36 c from the node X2); -   4) between the pads 22 c and 22 d and the pads 27 c and 27 d of the     transistor N3 (see FIG. 3B) (VSS is supplied to the pads 27 c and 27     d through the local interconnects 44 b and 44 c); and -   5) between the local interconnects 43 b and 43 c and the local     interconnects 44 b and 44 c (see FIG. 3B).

In this embodiment, the faces of the nanosheets 21 c of the transistor P3 closer to the nanosheets 26 c of the transistor N3 are not covered with the gate interconnect 31 c, and the faces of the nanosheets 26 c of the transistor N3 closer to the nanosheets 21 c of the transistor P3 are not covered with the gate interconnect 36 c. This reduces the distance between the transistor P3 and the transistor N3, and therefore increases the capacitances 3) and 4) above.

As described above, in this embodiment, in the transistors P2, P3, and P4, capacitances are produced between the nanosheets 21 b, 21 c, and 21 d and the gate interconnects 31 b, 31 c, and 31 d. In the transistors N2, N3, and N4, capacitances are produced between the nanosheets 26 b, 26 c, and 26 d and the gate interconnects 36 b, 36 c, and 36 d. Also, the faces of the nanosheets 21 b, 21 c, and 21 d closer to the nanosheets 26 b, 26 c, and 26 d are exposed from the gate interconnects 31 b, 31 c, and 31 d, and the faces of the nanosheets 26 b, 26 c, and 26 d closer to the nanosheets 21 b, 21 c, and 21 d are exposed from the gate interconnects 36 b, 36 c, and 36 d. Therefore, since the spacing between the nanosheets 21 b, 21 c, and 21 d and the nanosheets 26 b, 26 c, and 26 d can be reduced, the area of the capacitive cell can be made smaller. In addition, in the transistors P3 and N3, for example, larger capacitances can be secured between the gate interconnect 31 c and the gate interconnect 36 c and between the pair of pads 22 c and 22 d and the pair of pads 27 c and 27 d. In this embodiment, the fixed value output unit may be omitted. In this case, the capacitive cell may be configured so as to supply VSS directly to the gates of the transistors P2, P3, and P4 and supply VDD directly to the gates of the transistors N2, N3, and N4, for example.

Also, while three p-type transistors and three n-type transistors are provided to constitute the capacitance in this embodiment, the number of transistors constituting the capacitance is not limited to this.

(Alteration)

While each transistor includes one stack of nanosheets placed singly in the Y direction in the above embodiment, each transistor may include two or more stacks of nanosheets placed in the Y direction. In this case, it is only necessary for nanosheets opposed to each other at the boundary of the p-type region and the n-type region to be exposed from the corresponding gate interconnects. That is, assuming that the nanosheets of a p-type transistor constitute a first nanosheet unit and the nanosheets of an n-type transistor constitute a second nanosheet unit, the followings are only necessary. That is, among the nanosheets of the first nanosheet unit, nanosheets closest to the second nanosheet unit are exposed from the corresponding gate interconnect on their faces opposed to the second nanosheet unit in the Y direction. Among the nanosheets of the second nanosheet unit, nanosheets closest to the first nanosheet unit are exposed from the corresponding gate interconnect on their faces opposed to the first nanosheet unit in the Y direction. With this, similar effects to those obtained in the above embodiment are obtained.

FIGS. 5A and 5B are cross-sectional views taken vertically as viewed in plan, showing a configuration of an alteration of this embodiment. In the configuration of FIGS. 5A-5B, the transistor P3 has two stacks of nanosheets 21 c and 23 c arranged side by side in the Y direction, and the transistor N3 has two stacks of nanosheets 26 c and 28 c arranged side by side in the Y direction. On one side of the nanosheets 21 c, 23 c, 26 c, and 28 c in the X direction, pads 22 d, 24 d, 27 d, and 29 d are formed respectively.

The faces of the nanosheets 21 c opposed to the nanosheets 26 c in the Y direction are exposed, not covered with the gate interconnect 31 c. The faces of the nanosheets 26 c opposed to the nanosheets 21 c in the Y direction are exposed, not covered with the gate interconnect 36 c.

That is, assuming that the nanosheets 21 c and 23 c constitute a first nanosheet unit 24 and the nanosheets 26 c and 28 c constitute a second nanosheet unit 25, among the nanosheets of the first nanosheet unit 24, the nanosheets 21 c closest to the second nanosheet unit 25 are exposed from the gate interconnect 31 c on their faces opposed to the second nanosheet unit 25 in the Y direction. Among the nanosheets of the second nanosheet unit 25, the nanosheets 26 c closest to the first nanosheet unit 24 are exposed from the gate interconnect 36 c on their faces opposed to the first nanosheet unit 24 in the Y direction.

Second Embodiment

FIGS. 6 and 7A-7B are views showing a layout structure of a capacitive cell according to the second embodiment, where FIG. 6 is a plan view and FIGS. 7A-7B are cross-sectional views taken vertically as viewed in plan. Specifically, FIG. 7A shows a cross section taken along line Y4-Y4′ and FIG. 7B shows a cross section taken along line Y5-Y5′. The layout structure shown in FIGS. 6 and 7A-7B resembles the layout structure shown in FIGS. 1, 2A-2B, and 3A-3C: e.g., the placement of the power lines and the nanosheets and pads of the transistors is similar. In the following description, therefore, description of similar components to those in the first embodiment will be omitted in some cases.

FIG. 8 is a circuit diagram of the capacitive cell shown in FIGS. 6 and 7A-7B. As shown in FIG. 8 , the capacitive cell has p-type transistors P1, P2, P3, P4, and P5 and n-type transistors N1, N2, N3, N4, and N5. The transistors N2 to N4 function as capacitances. The transistor P5 and the transistor N1 constitute a fixed value output unit 5. The fixed value output unit 5 outputs a high fixed value (VDD) to a node X1 and a low fixed value (VSS) to a node X2. The transistor P5 is connected to VDD at its source, to the gate of the transistor N1 at its drain, and to the drain of the transistor N1 at its gate. The transistor N1 is connected to VSS at its source and to the gate of the transistor P5 at its drain. The gate of the transistor N1 corresponds to the node X1, and the gate of the transistor P5 corresponds to the node X2.

The transistors P1 to P4 and the transistor N5 are off-state transistors. Although the transistors P1 to P4 and the transistor N5 are not necessarily required for the circuit configuration of the capacitive cell, the presence of these transistors improves the regularity of the layout of the capacitive cell, which improves the ease of device manufacture, improves the yield, and reduces manufacturing variations.

The transistors N2 to N4 are connected to VSS at their sources and drains and to the node X1 at their gates. Since VDD is output to the node X1 from the fixed value output unit 5, the transistors N2 to N4 function as capacitances.

As shown in FIGS. 6 and 7A-7B, gate interconnects 131 a, 131 b, 131 c, 131 d, and 131 e extending in parallel in the Y direction are formed in the p-type region. The gate interconnects 131 a, 131 b, 131 c, 131 d, and 131 e have the same width and are placed at the same pitch. Gate interconnects 136 a, 136 b, 136 c, 136 d, and 136 e extending in parallel in the Y direction are formed in the n-type region. The gate interconnects 136 a, 136 b, 136 c, 136 d, and 136 e have the same width and are placed at the same pitch. The positions of the gate interconnects 131 a, 131 b, 131 c, 131 d, and 131 e are the same as the positions of the gate interconnects 136 a, 136 b, 136 c, 136 d, and 136 e, respectively, in the X direction. That is, the gate interconnects 131 a and 136 a are placed in line in the Y direction, the gate interconnects 131 b and 136 b are placed in line in the Y direction, the gate interconnects 131 c and 136 c are placed in line in the Y direction, the gate interconnects 131 d and 136 d are placed in line in the Y direction, and the gate interconnects 131 e and 136 e are placed in line in the Y direction.

The gate interconnect 131 a surrounds the peripheries of the nanosheets 21 a of the transistor P1 in the Y and Z directions through gate insulating films (not shown). The gate interconnect 131 a is to be the gate of the transistor P1. Similarly, the gate interconnects 131 b, 131 c, 131 d, and 131 e surround the peripheries of the nanosheets 21 b, 21 c, 21 d, and 21 e of the transistors P2, P3, P4, and P5, respectively, in the Y and Z directions through gate insulating films (not shown). The gate interconnects 131 b, 131 c, 131 d, and 131 e are to be the gates of the transistors P2, P3, P4, and P5, respectively.

The gate interconnect 136 a surrounds the peripheries of the nanosheets 26 a of the transistor N1 in the Y and Z directions through gate insulating films (not shown). The gate interconnect 136 a is to be the gate of the transistor Ni. Similarly, the gate interconnects 136 b, 136 c, 136 d, and 136 e surround the peripheries of the nanosheets 26 b, 26 c, 26 d, and 26 e of the transistors N2, N3, N4, and N5, respectively, in the Y and Z directions through gate insulating films (not shown). The gate interconnects 136 b, 136 c, 136 d, and 136 e are to be the gates of the transistors N2, N3, N4, and N5, respectively.

The gate interconnects 131 a and 136 a placed side by side in the Y direction are mutually connected through a bridge 133 a formed between the gate interconnects 131 a and 136 a. The gate interconnects 131 b and 136 b placed side by side in the Y direction are mutually connected through a bridge 133 b formed between the gate interconnects 131 b and 136 b. The gate interconnects 131 c and 136 c placed side by side in the Y direction are mutually connected through a bridge 133 c formed between the gate interconnects 131 c and 136 c. The gate interconnects 131 d and 136 d placed side by side in the Y direction are mutually connected through a bridge 133 d formed between the gate interconnects 131 d and 136 d. The gate interconnects 131 e and 136 e placed side by side in the Y direction are mutually connected through a bridge 133 e formed between the gate interconnects 131 e and 136 e.

Local interconnects 141, 142, 143, 144, 145, 146, 147, and 148 extending in the Y direction are formed in a local interconnect layer. The local interconnect 141 is connected with the pads 22 a and 27 a. The local interconnect 142 is connected with the pads 22 b and 27 b and also connected with the power line 12 through a via. The local interconnect 143 is connected with the pads 22 c and 27 c and also connected with the power line 12 through a via. The local interconnect 144 is connected with the pads 22 d and 27 d and also connected with the power line 12 through a via. The local interconnect 145 is connected with the pad 22 e. The local interconnect 146 is connected with the pad 22 f and also connected with the power line 11 through a via. The local interconnect 147 is connected with the pad 27 e and also connected with the power line 12 through a via. The local interconnect 148 is connected with the pad 27 f.

Metal interconnects 151, 152, 153, and 154 extending in the X direction are formed in an M1 interconnect layer. The metal interconnects 152 and 154 correspond to the node X1 of the circuit, and the metal interconnects 151 and 153 correspond to the node X2 of the circuit. The metal interconnect 151 is connected with the gate interconnect 131 e through a via and also connected with the local interconnect 141 through a via. The metal interconnect 152 is connected with the gate interconnects 131 a, 131 b, 131 c, and 131 d through vias and also connected with the local interconnect 145 through a via. The metal interconnect 153 is connected with the gate interconnect 136 e through a via and also connected with the local interconnect 141 through a via. The metal interconnect 154 is connected with the gate interconnects 136 a, 136 b, 136 c, and 136 d through vias and also connected with the local interconnect 148 through a via.

As in the first embodiment, the nanosheets 21 a and the nanosheets 26 a are opposed to each other in the Y direction. The faces of the nanosheets 21 a closer to the nanosheets 26 a in the Y direction are exposed, not covered with the gate interconnect 131 a. The faces of the nanosheets 26 a closer to the nanosheets 21 a in the Y direction are exposed, not covered with the gate interconnect 136 a.

Similarly, the nanosheets 21 b and the nanosheets 26 b are opposed to each other in the Y direction, the nanosheets 21 c and the nanosheets 26 c are opposed to each other in the Y direction, the nanosheets 21 d and the nanosheets 26 d are opposed to each other in the Y direction, and the nanosheets 21 e and the nanosheets 26 e are opposed to each other in the Y direction. The faces of the nanosheets 21 b, 21 c, 21 d, and 21 e closer to the nanosheets 26 b, 26 c, 26 d, and 26 e, respectively, in the Y direction are exposed, not covered with the gate interconnects 131 b, 131 c, 131 d, and 131 e, respectively. The faces of the nanosheets 26 b, 26 c, 26 d, and 26 e closer to the nanosheets 21 b, 21 c, 21 d, and 21 e, respectively, in the Y direction are exposed, not covered with the gate interconnects 136 b, 136 c, 136 d, and 136 e, respectively.

Also, since gate interconnects supplied with VDD and local interconnects supplied with VSS are formed across the p-type region and the n-type region, capacitances are formed between such gate interconnects and local interconnects. For example, focusing on the transistors P3 and N3, the gate interconnects 131 c and 136 c, mutually connected by the bridge 133 c, are supplied with VDD through the metal interconnect 152. Also, the local interconnects 143 and 144 are supplied with VSS from the power line 12. Therefore, capacitances are formed between the gate interconnects 131 c and 136 c with the bridge 133 c therebetween and the local interconnects 143 and 144.

As described above, in this embodiment, in the transistors N2, N3, and N4, capacitances are produced between the nanosheets 26 b, 26 c, and 26 d and the gate interconnects 136 b, 136 c, and 136 d. Also, the faces of the nanosheets 21 b, 21 c, and 21 d closer to the nanosheets 26 b, 26 c, and 26 d are exposed from the gate interconnects 131 b, 131 c, and 131 d, and the faces of the nanosheets 26 b, 26 c, and 26 d closer to the nanosheets 21 b, 21 c, and 21 d are exposed from the gate interconnects 136 b, 136 c, and 136 d. Therefore, since the spacing between the nanosheets 21 b, 21 c, and 21 d and the nanosheets 26 b, 26 c, and 26 d can be reduced, the area of the capacitive cell can be made smaller In addition, in the transistors P3 and N3, for example, large capacitances can be secured between the gate interconnects 131 c and 136 c with the bridge 133 c therebetween and the local interconnects 143 and 144.

In this embodiment, the fixed value output unit may be omitted. In this case, the capacitive cell may be configured so as to supply VDD directly to the gates of the transistors N2, N3, and N4, for example.

While three n-type transistors are provided to constitute the capacitance in this embodiment, the number of transistors constituting the capacitance is not limited to this.

Also, as in the alteration of the first embodiment, two or more stacks of nanosheets may be placed in the Y direction in each transistor.

(Alteration 1)

The capacitive cell of the above embodiment can also be configured by exchanging the conductivity types of the transistors.

FIG. 9 is a plan view showing a layout structure of a capacitive cell according to Alteration 1 of the second embodiment. The layout structure shown in FIG. 9 corresponds to one obtained by inverting the layout structure of FIG. 6 vertically in the figure, exchanging the p-type and the n-type, and exchanging VDD and VSS. In the layout structure of FIG. 9 , the placement of the power lines, the transistors, the gate interconnects, the local interconnects, and the M1 interconnects is similar to that in the layout structure of FIG. 6 , but the connection relations between the M1 interconnects and the local interconnects/gate interconnects and the connection relations between the local interconnects and the power lines are different from those in the layout structure of FIG. 6 .

FIG. 10 is a circuit diagram of the capacitive cell shown in FIG. 9 . The circuit of FIG. 10 corresponds to one obtained by inverting the circuit of FIG. 8 vertically in the figure, exchanging the p-type and the n-type, and exchanging VDD and VSS.

As shown in FIG. 10 , the cell shown in FIG. 9 has p-type transistors P1, P2, P3, P4, and P5 and n-type transistors N1, N2, N3, N4, and N5. The transistors P2 to P4 function as capacitances. The transistor P1 and the transistor N5 constitute a fixed value output unit 5. The fixed value output unit 5 outputs a low fixed value (VSS) to a node X1 and a high fixed value (VDD) to a node X2. The transistor P1 is connected to VDD at its source, to the gate of the transistor N5 at its drain, and to the drain of the transistor N5 at its gate. The transistor N5 is connected to VSS at its source and to the gate of the transistor P1 at its drain. The gate of the transistor P1 corresponds to the node Xl, and the gate of the transistor N5 corresponds to the node X2.

The transistors P2 to P4 are connected to VDD at their sources and drains and to the node X1 at their gates. Since VSS is output to the node X1 from the fixed value output unit 5, the transistors P2 to P4 function as capacitances. The transistors N1 to N4 and the transistor P5 are off-state transistors.

In FIG. 9 , the local interconnects 142, 143, 144, and 145 are connected with the power supply line 11 through vias. The local interconnect 148 is connected with the power line 12 through a via. The metal interconnect 151 is connected with the gate interconnects 131 a, 131 b, 131 c, and 131 d through vias and also connected with the local interconnect 146 through a via. The metal interconnect 152 is connected with the gate interconnect 131 e through a via and also connected with the local interconnect 141 through a via. The metal interconnect 153 is connected with the gate interconnects 136 a, 136 b, 136 c, and 136 d through vias and also connected with the local interconnect 147 through a via. The metal interconnect 154 is connected with the gate interconnect 136 e through a via and also connected with the local interconnect 141 through a via.

In this alteration, also, similar effects to those obtained in the above embodiment are obtained.

(Alteration 2)

FIG. 11 is a plan view showing a layout structure of a capacitive cell according to Alteration 2 of the second embodiment. The layout structure shown in FIG. 11 is similar to the layout structure of FIG. 6 in the placement of the power lines, the transistors, and the gate interconnects, but is different partly in the placement of the local interconnects and also different in the connection relations between the M1 interconnects and the local interconnects/gate interconnects and the connection relations between the local interconnects and the power lines.

FIG. 12 is a circuit diagram of the capacitive cell shown in FIG. 11 . The circuit of FIG. 12 corresponds to one obtained by connecting the sources and drains of the transistors P1 to P4 and N2 to N4, which are directly connected to VSS in the circuit of FIG. 8 , to a node X2 to which a fixed value output unit 5 outputs a low fixed value (VSS).

As shown in FIG. 12 , the cell shown in FIG. 11 has p-type transistors P1, P2, P3, P4, and P5 and n-type transistors N1, N2, N3, N4, and N5. The transistors N2 to N4 function as capacitances. The transistor P5 and the transistor N1 constitute the fixed value output unit 5. The fixed value output unit 5 outputs a high fixed value (VDD) to a node X1 and the low fixed value (VSS) to the node X2. The transistor P5 is connected to VDD at its source, to the gate of the transistor N1 at its drain, and to the drain of the transistor N1 at its gate. The transistor N1 is connected to VSS at its source and to the gate of the transistor P5 at its drain. The gate of the transistor N1 corresponds to the node X1, and the gate of the transistor P5 corresponds to the node X2.

The transistors N2 to N4 are connected to the node X2 at their sources and drains and to the node X1 at their gates. Since VDD is output to the node X1 from the fixed value output unit 5 and VSS is output to the node X2 from the fixed value output unit 5, the transistors N2 to N4 function as capacitances.

The transistors P1 to P4 and the transistor N5 are off-state transistors. Although the transistors P1 to P4 and N5 are not necessarily required for the circuit configuration of the capacitive cell, the presence of these transistors improves the regularity of the layout of the capacitive cell, which improves the ease of device manufacture, improves the yield, and reduces manufacturing variations.

Local interconnects 241, 242, 243, 244, 245, 246, 247, and 248 extending in the Y direction are formed in a local interconnect layer. The local interconnect 241 is connected with the pad 22 a. The local interconnect 242 is connected with the pad 27 a and also connected with the power line 12 through a via. The local interconnect 243 is connected with the pads 22 b and 27 b. The local interconnect 244 is connected with the pads 22 c and 27 c. The local interconnect 245 is connected with the pads 22 d and 27 d. The local interconnect 246 is connected with the pad 22 e and also connected with the power line 11 through a via. The local interconnect 247 is connected with the pad 27 e. The local interconnect 248 is connected with the pads 22 f and 27 f.

Metal interconnects 251, 252, 253, and 254 extending in the X direction are formed in an M1 interconnect layer. The metal interconnects 252 and 254 correspond to the node X1 of the circuit, and the metal interconnects 251 and 253 correspond to the node X2 of the circuit. The metal interconnect 251 is connected with the local interconnects 241, 243, 244, and 245 through vias and also connected with the gate interconnect 131 e through a via. The metal interconnect 252 is connected with the gate interconnects 131 a, 131 b, 131 c, and 131 d through vias and also connected with the local interconnect 248 through a via. The metal interconnect 253 is connected with the local interconnects 243, 244, 245, and 247 through vias. The metal interconnect 254 is connected with the gate interconnects 136 a, 136 b, 136 c, and 136 d through vias and also connected with the local interconnect 248 through a via.

In this alteration, also, similar effects to those obtained in the above embodiment are obtained. In addition, in this alteration, since the sources and drains of the transistors other than the transistor N1 constituting the fixed value output unit are not directly connected to VSS, occurrence of a device breakdown caused by electrostatic discharge (ESD) can be prevented.

In this alteration, also, as in Alteration 1, the capacitive cell can be configured by exchanging the conductivity types of the transistors.

While the power lines supplying VDD and VSS are BPRs in the above embodiments and alterations, the configuration is not limited to this. The power lines may be M1 interconnects, for example.

While four M1 interconnects extending in the X direction are formed in the above embodiments and alterations, some of the M1 interconnects may be omitted.

According to the present disclosure, a layout structure of a large-capacity capacitive cell using forksheet FETs can be implemented. The present disclosure is therefore useful for downsizing and higher integration of semiconductor chips, for example. 

What is claimed is:
 1. A semiconductor integrated circuit device including a standard cell that is a capacitive cell, the standard cell having a p-type region in which p-type transistors are formed and an n-type region in which n-type transistors are formed lying adjacent to each other in a first direction, comprising: a first nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in a second direction vertical to the first direction in the p-type region; a second nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in the second direction in the n-type region; a first gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the first nanosheet unit in the first direction and a third direction perpendicular to the first and second directions; a first pair of pads each connected with each end of the nanosheet of the first nanosheet unit in the second direction; a second gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the second nanosheet unit in the first direction and the third direction; and a second pair of pads each connected with each end of the nanosheet of the second nanosheet unit in the second direction, wherein the first pair of pads and the second gate interconnect are supplied with a first power supply voltage, and the second pair of pads and the first gate interconnect are supplied with a second power supply voltage lower than the first power supply voltage, and the first nanosheet unit and the second nanosheet unit are opposed to each other in the first direction, a nanosheet among the nanosheet of the first nanosheet unit closest to the second nanosheet unit is exposed from the first gate interconnect on a face opposed to the second nanosheet unit in the first direction, and a nanosheet among the nanosheet of the second nanosheet unit closest to the first nanosheet unit is exposed from the second gate interconnect on a face opposed to the first nanosheet unit in the first direction.
 2. The semiconductor integrated circuit device of claim 1, wherein each of the nanosheets of the first and second nanosheet units is constituted by one nanosheet or a stacked structure of a plurality of nanosheets overlapping as viewed in plan.
 3. The semiconductor integrated circuit device of claim 1, wherein the first and second gate interconnects are placed at a same position in the second direction.
 4. The semiconductor integrated circuit device of claim 1, comprising: a first power line extending in the second direction, supplying the first power supply voltage; a second power line extending in the second direction, supplying the second power supply voltage; and a fixed value output unit connected with the first and second power lines, supplying the second power supply voltage to the first gate interconnect and supplying the first power supply voltage to the second gate interconnect, wherein the fixed value output unit includes a first p-type transistor formed in the p-type region, connected with the first power line at its source, and a first n-type transistor formed in the n-type region, connected with the second power line at its source, the first gate interconnect is electrically connected with a gate of the first p-type transistor and the source of the first n-type transistor, and the second gate interconnect is electrically connected with a drain of the first p-type transistor and a gate of the first n-type transistor.
 5. A semiconductor integrated circuit device including a standard cell that is a capacitive cell, the standard cell having a first region in which transistors of a first-conductivity type are formed and a second region in which transistors of a second conductivity type are formed lying adjacent to each other in a first direction, comprising: a first nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in a second direction vertical to the first direction in the first region; a second nanosheet unit constituted by one nanosheet or two or more nanosheets arranged in the first direction, extending in the second direction in the second region; a first gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the first nanosheet unit in the first direction and a third direction perpendicular to the first and second directions; a first pair of pads each connected with each end of the nanosheet of the first nanosheet unit in the second direction; a second gate interconnect extending in the first direction, formed to surround a periphery of the nanosheet of the second nanosheet unit in the first direction and the third direction; and a second pair of pads each connected with each end of the nanosheet of the second nanosheet unit in the second direction, the first and second gate interconnects are supplied with a first power supply voltage, and the first and second pairs of pads are supplied with a second power supply voltage different from the first power supply voltage, and the first nanosheet unit and the second nanosheet unit are opposed to each other in the first direction, a nanosheet among the nanosheet of the first nanosheet unit closest to the second nanosheet unit is exposed from the first gate interconnect on a face opposed to the second nanosheet unit in the first direction, and a nanosheet among the nanosheet of the second nanosheet unit closest to the first nanosheet unit is exposed from the second gate interconnect on a face opposed to the first nanosheet unit in the first direction.
 6. The semiconductor integrated circuit device of claim 5, wherein each of the nanosheets of the first and second nanosheet units is constituted by one nanosheet or a stacked structure of a plurality of nanosheets overlapping as viewed in plan.
 7. The semiconductor integrated circuit device of claim 5, wherein the first and second gate interconnects are placed at a same position in the second direction, and a gate connecting portion is formed between the first gate interconnect and the second gate interconnect for connecting the first and second gate interconnects.
 8. The semiconductor integrated circuit device of claim 5, comprising: a first local interconnect extending in the first direction, connecting one of the first pair of pads and one of the second pair of pads; and a second local interconnect extending in the first direction, connecting the other of the first pair of pads and the other of the second pair of pads.
 9. The semiconductor integrated circuit device of claim 5, wherein the first conductivity type is a p-type and the second conductivity type is an n-type, and the first power supply voltage is higher than the second power supply voltage.
 10. The semiconductor integrated circuit device of claim 5, wherein the first conductivity type is an n-type and the second conductivity type is a p-type, and the first power supply voltage is lower than the second power supply voltage.
 11. The semiconductor integrated circuit device of claim 5, comprising: a first power line extending in the second direction, supplying the first power supply voltage; a second power line extending in the second direction, supplying the second power supply voltage; and a fixed value output unit connected with the first and second power lines, supplying the first power supply voltage to the first and second gate interconnects, wherein the fixed value output unit includes a first transistor formed in the first region, connected with the first power line at its source, and a second transistor formed in the second region, connected with the second power line at its source, the first and second gate interconnects are electrically connected with a drain of the first transistor and a gate of the second transistor.
 12. The semiconductor integrated circuit device of claim 11, wherein the fixed value output unit supplies the second power supply voltage to the first and second pairs of pads, and the first and second pairs of pads are electrically connected with a gate of the first transistor and a drain of the second transistor. 